Patterning challenges for the semiconductor industry are growing as the number of multi-patterned layers being used in the 10nm and beyond nodes increase. Patterning requires highly accurate overlay ...

Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years. In previous work we described a scenario where optical overlay ...

SAN JOSE — KLA-Tencor Corp. here today rolled out a new software feature for its optical overlay metrology tools in 300-mm fab applications. The company unveiled Archer Analyzer–a software feature ...

San Jose-based KLA-Tencor Corp. rolled out its latest optical overlay metrology tool, the Archer 10, a product that the company said offers a 30 percent improvement in precision down to 2 nanometers.