In a major leap for the global semiconductor industry, a joint Chinese research team has developed a method that can slash defects in lithography – a critical step in chipmaking – by up to 99 per cent ...
ALBANY, N.Y.--(BUSINESS WIRE)--SEMATECH announced today that researchers have reached a significant milestone in reducing tool-generated defects from multi-layer deposition of mask blanks used for ...
A distinguished expert in AI-driven computational lithography and advanced metrology, Botlagunta Preethish Nandan has recently come up with a new approach to elevate the precision and efficiency of ...
How Does EUV Lithography Work? EUV Lithography is a state-of-the-art technology in chip manufacturing that uses highly energetic ultraviolet light to carve detailed patterns onto semiconductor ...
Extreme Ultraviolet (EUV) lithography represents a transformative advancement in semiconductor fabrication, utilising 13.5‐nm wavelength light to achieve remarkably fine feature sizes far below the 10 ...
Milpitas, CA. KLA-Tencor has announced the new FlashScan reticle blank (composite substrates onto which the reticle pattern is written) inspection product line. While KLA-Tencor has been a major ...
TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...
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